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[Extreme ultraviolet vacuum environment design to improve mass and semiconductor manufacturing precision] Innovation and challenges in extreme ultraviolet, semiconductor vacuum, and vacuum design

 

In a vacuum environment, interaction with fine particles can be reduced, allowing extreme ultraviolet (EUV) light to be transmitted more effectively, improving the performance of optical devices and minimizing light loss. Additionally, the vacuum environment is free of dust and other impurities, which helps maintain the accuracy and precision of the optics.

Mass has considered the vacuum environment in the design and development of extreme ultraviolet (EUV) optical devices, which can help improve the performance of optical devices and provide better quality.

 

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